Study of Physical Properties in Titanium Thin Films Prepared by Sputtering Method

Abstract

Study of physical properties in titanium thin films prepared by sputtering method which
RF Magnetron source Power 500 Watt in 10-3 mbar .The prepare substrate in 2500C and coated in 20
and 40 minutes .The thin films of Titanium have resistanced 280.0 and 69.0 k?? with gauge factor
in films 2.56 and 2.09 respectively. The study of physical properties of thin films by strain gauge
method, founded that resistance increase with force tension in films because the length ??L have
increased and the atom???s titanium in thin films tried to arrangement with force tension. The gauge
factors have related with deposition in thin films.